Diyala Journal of Engineering Sciences DJES

Volume 9, No. 3, Pages: 81-89,  September 2016

 (Received: 25/5/2015; Accepted: 17/11/2015)

Deposition of Tio₂/Pt Composite Particles Using Pulsed Laser Deposition Technique

 Amin Daway Thamir

Production and Metallurgy Engineering Department, University of Technology

Adawiya J. Haider

Center of Nanotechnology, University of Technology

Ghalib A. Ali

Production and Metallurgy Engineering Department, University of Technology

DOI:https://dx.doi.org/10.24237/djes.2016.09307

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ABSTRACT

In the present work, the titanium oxide platinum (TiO₂/Pt) composite particles were deposited on the Si and glass substrates at (400)°C using pulsed laser deposition technique to ablation of TiO₂ target at constant laser energy 800 mJ, a double frequency Q-switching Nd: YAG laser beam ( λ= 532 nm, repetition rate 6Hz and the pulsed duration 10ns). Ultraviolet visible (UV-Vis) spectroscopy, X-ray diffraction (XRD),X-ray fluorescence (XRF), Atomic force microscopy (AFM),Scanning Electron Microscopy (SEM), electrical conductivity (σ_dc), Hall coefficient (R_H) ,(I-V) and (C-V) were used to characterize the morphology and electrical of the films. The results showed that the transparency of film reached to about (80%) with optical band gap (3.64) and (3.76) eV for Pure TiO₂ and 5% Pt:TiO₂ respectively. The structural and composition of the obtained films at level 5% of platinum doping into TiO₂ have been determined. The results indicated that the prepared films (Pt doped TiO₂) were nanostructure and uniform with diameters less than 20 nm.

Keywords: Pulsed Laser Deposition Technique, Pt doped TiO₂

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